Prof. Glenn H. Chapman: SFU Eng. Science
Research Equipment
Laser Table equipment consists of a focused 5 watt argon ion laser beam
(488/514 nm wavelength) with spot sizes down to 1 micron full width half
maximum. An electro-optic shutter controls the beam pulse duration from
single 2 microsecond pulse through to continuous exposure and multiple
pulses. IC's are positioned below the beam using a laser interferometry
controlled XY table with position accuracy of 0.1 micrometers over a 25x25
cm area. The table can move to locations and stabilize in less than 0.1
sec for distances less than 1 mm, and about 1 second for the full 25 cm.
A TV camera image of the laser position area is displayed in the control
system computer using a real time frame grabber on the TV microscope image.
Digitally stored images can be taken of the cut points to verify the location
of operations. IC's can be worked on in any of the following formats: chips
or wafers, 24 or 40 pin DIPS, 64 pin-grid arrays. The combined laser, shutter
and positioning system operates under a integrated MSWindows control system
developed here at SFU. The system allows automatic moving to position,
adjustment of the pulse parameters (duration, number of pulses, shape etc)
and firing of the laser pulse. Scripts of control commands enable the table
to move through a sequence of operations without needing any user input.
The laser table is being converted in a UV Laser micromachining system
by the addition of a Nd:Yag laser which produces high power light pulses
at the IR (1064 nm), Green (533 nm), UV (266 nm) and Vacuum UV (213 nm)
wavelengths. This will enable photoablative cutting plastic material for
biomedical applicaitons.
Microfabriction and micromachining research work at SFU's microfabriction
laboratory including oxidation/doping furnaces, film RF sputter deposition
system, photolithography, wet etching stations and inspection/measurement
equipment.
Several Pentium I/II/III class PC's for personal use of my Graduates
students. Design work using SFU's VLSI Design facility with 2 Spark 10,
2 Spark 20 and one IPX file server. IC design with Cadence and Kic computer
aided design tools. Analysis with Hspice circuit simulation, Ansys fine
element program and Ssupreme4 processing simulation. Access to Canadian
Microelectronic Corp.'s 3 micron, 1.2 micron, 0.8 micron and 0.5 mircon
mulitproject wafer design submissions.
Funding Support
Funding for this research comes from NSERC Operating grants, B.C. Advanced
Systems Institute Senior Fellowship, a major grant from the Canadian Foundation
for Innovation, BC Knowledge Fund, and Centre for System Studies Strategic
Studies grants, plus industrial research grants.
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Last updated Mar. 10, 2001